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Advanced FIB-based sample preparation for 3D characterization of 45nm ICs

Published online by Cambridge University Press:  03 August 2008

F Lorut
Affiliation:
ST Microelectronics, France
D Delille
Affiliation:
FEI Company, The Netherlands
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Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

Type
Research Article
Copyright
© 2008 Microscopy Society of America

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