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Ultra Flat Gold Surfaces for Use in Chemical Force Microscopy: Scanning Probe Microscopy Studies of the Effect of Preparation Regime on Surface Morphology

Published online by Cambridge University Press:  08 August 2002

Carl Masens
Affiliation:
University of Technology, New South Wales, Australia
Jurgen Schulte
Affiliation:
University of Technology, New South Wales, Australia
Matthew Phillips
Affiliation:
University of Technology, New South Wales, Australia
Svetlana Dligatch
Affiliation:
CSIRO Division of Telecommunications and Industrial Physics, New South Wales, Australia
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Abstract

The preparation of ultra flat gold surfaces for use in chemical force microscopy (CFM) has beenstudied. The surfaces were studied in terms of substrate effects by comparing mica, Si (110) wafer and glassslides. The effect of different annealing regimes was also investigated. Measurements on these surfaces weremade by both atomic force microscopy (AFM) (in contact and tapping mode) and by scanning tunnelingmicroscopy (STM). The films contain different morphologies with respect to grain size and topography.Calculations of surface roughness present values less than 2.5 nm for all surfaces studied, making the choice ofthe flattest surface difficult if based on criteria of surface roughness alone. Additionally, it is shown thatdifferent acquisition parameters can produce dissimilar images that have stability and reproducibility.

Type
Scanning Probe Microscopy
Copyright
2000 Microscopy Society of America

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