Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-12-01T06:40:47.553Z Has data issue: false hasContentIssue false
  • English
  • Français

Tutorial: Tem Specimen Preparation in the Physical Sciencestripod Polishing and Ion Milling

Published online by Cambridge University Press:  02 July 2020

Ron Anderson
Ron Anderson*
Affiliation:
IBM Analytical Services, Mail Stop E-40, Hopewell Jet., NY12533, USA
Get access

Extract

Over the past few decades, the demands of modern analytical electron microscopy have increased the need for TEM specimen preparation techniques with a minimum of misleading artifacts in terms of chemical microanalysis. At the same time, the demands of modern industrial materials, be they semiconductor, polymeric or composite in nature, call for speed, flexibility and high spatial resolution as well. The response from the electron microscopy community, especially that portion in the private sector, have been to devise (or advocate) radically different forms of TEM thin specimen preparation from that of classic replication, electropolishing and ion thinning.

This tutorial sets forth the goals of TEM specimen preparation, and the requirements for a "good" TEM specimen. The strategic choices governing which technique to use for preparing a wide variety of specimens will be covered. A TEM Specimen Preparation Flow Chart will be used to plot a course that makes optimum use of the preparation techniques available as a function of the type of specimen to be prepared.

Type
Tem Specimen Preparation in the Physical Sciences
Information
Microscopy and Microanalysis , Volume 4 , Issue S2: Proceedings: Microscopy & Microanalysis '98, Microscopy Society of America 56th Annual Meeting, Microbeam Analysis Society 32nd Annual Meeting, Atlanta, Georgia July 12-16, 1998 , July 1998 , pp. 876 - 877
Copyright
Copyright © Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Klepeis, S. J., et al., in Specimen Preparation for Transmission Electron Microscopy of Materials, ed. Bravman, , et al., Mater. Res. Soc. Proc. 115, Pittsburgh, PA USA p. 179 (1987). R. M. Anderson, et al., Microscopy of Semiconducting Materials 1989, Proceedings of the Physics Conference held at Oxford University, 10-13 April 1989, ed. by Cullis, A. G. and Hutchison J. L., Institute of Physics Conference Series Number 100, Bristol and New York, 1989. Benedict, J.P. et al., EMSA Bulletin, 19, 2, p. 74, 1989. Klepeis, S. J., et al., EMSA Proceedings, ed. by Bailey, G.W., San Francisco Press, p. 712, 1989. Benedict, J.P., et al., in International Symposium on Electron Microscopy, ed. by Kuo, K. and Yao, J., World Scientific, p. 450, 1990. Benedict, J., et al., in Specimen Preparation for Transmission Electron Microscopy of Materials-H, ed. Anderson, R., Mater. Res. Soc. Proc. 199, Pittsburgh, PA USA p. 189 (1990). Benedict, J. et al. in Specimen Preparation for Transmission Electron Microscopy of Materials-Ill, ed. Anderson et al., Mater. Res. Soc. Proc. 254, Pittsburgh, PA USA p. 121 (1992). Anderson, R. in Specimen Preparation for Transmission Electron Microscopy of Materials-Ill, ed. Anderson, et al., Mater. Res. Soc. Proc. 254, Pittsburgh, PA USA p. 141 (1992). Anderson, R., et al., Microbeam Analysis—1995, Proceedings of the 29th Annual Meeting of the Microbeam Analysis Society, ed. E. Etz, p. 135, 1995. Anderson, et al.. in Specimen Preparation for Transmission Electron Microscopy of Materials-IV, ed. Anderson, et al., Mater. Res. Soc. Proc. 480, Pittsburgh, PA USA p. 187 & 193 (1997).Google Scholar
2.Barna, A., in Specimen Preparation for Transmission Electron Microscopy of Materials-II, ed. Anderson, R, Mater. Res. Soc. Proc. 199, Pittsburgh, PA USA p. 3 (1990) and numerous other citations.Google Scholar