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To-and-Fro Motion of W5Si3 on a β-Si3N4 Substrate at Elevated Temperatures

Published online by Cambridge University Press:  28 March 2002

S. Arai ,
K. Suzuki  and
H. Saka
S. Arai
Affiliation:
Center for Integrated Research in Science and Technology, Nagoya University, Nagoya 464-8603, Japan
K. Suzuki
Affiliation:
Department of Quantum Engineering and Department of Materials Science and Engineering, Nagoya University, Nagoya 464-8603, Japan
H. Saka
Affiliation:
Department of Quantum Engineering and Department of Materials Science and Engineering, Nagoya University, Nagoya 464-8603, Japan
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Abstract

Behavior of fine crystalline particles of W5Si3 on a β-Si3N4 substrate at high temperatures was observed by an in situ heating experiment in a transmission electron microscope. Some of the fine particles of W5Si3 moved in a to-and-fro manner.

Keywords

fine particlesto-and-fro motionin situ heating experimentW5Si3β-Si3N4
Type
Research Article
Information
Microscopy and Microanalysis , Volume 8 , Issue 1 , February 2002 , pp. 16 - 20
Copyright
© 2002 Microscopy Society of America

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