Hostname: page-component-586b7cd67f-2brh9 Total loading time: 0 Render date: 2024-11-28T03:30:29.623Z Has data issue: false hasContentIssue false

Thin-Film Reaction between α-Fe2O3 and (001) MgO

Published online by Cambridge University Press:  28 July 2005

Matthew T. Johnson
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue SE, 204 Amundson Hall, Minneapolis, MN 55455
C. Barry Carter
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue SE, 204 Amundson Hall, Minneapolis, MN 55455
Get access

Abstract

The kinetics of a thin-film, solid-state reaction were investigated in the spinel-forming oxide system Fe2O3/MgO. In this study, epitactic thin films of Fe2O3 (α, or corundum, structure) were deposited on (001)-oriented MgO using pulsed-laser deposition (PLD). The resulting diffusion couples were then reacted at elevated temperatures in air to induce the reaction between the thin-film and bulk substrate to form the spinel, MgFe2O4. Both the as-deposited and reacted diffusion couples were characterized using low-voltage scanning and transmission electron microscopy. These techniques allow the kinetics of the reaction and the structural properties of the spinel to be investigated.

Type
Research Article
Copyright
© 2005 Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)