Hostname: page-component-586b7cd67f-vdxz6 Total loading time: 0 Render date: 2024-12-01T00:24:18.772Z Has data issue: false hasContentIssue false
  • English
  • Français

TEM Studies of Cu2O-Si and Cu2O-InP Interfaces Made by Epitaxial Electrodeposition

Published online by Cambridge University Press:  01 August 2004

Fumiyasu Oba ,
Run Liu ,
Yeonseop Yu ,
E W Bohannan ,
Frank Ernst  and
Jay Switzer
Fumiyasu Oba
Affiliation:
Case Western Reserve University, Cleveland, Ohio
Run Liu
Affiliation:
University of Missouri-Rolla
Yeonseop Yu
Affiliation:
Case Western Reserve University, Cleveland, Ohio
E W Bohannan
Affiliation:
University of Missouri-Rolla
Frank Ernst
Affiliation:
Case Western Reserve University, Cleveland, Ohio
Jay Switzer
Affiliation:
University of Missouri-Rolla
Get access

Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 10 , Issue S02 , August 2004 , pp. 292 - 293
Copyright
© 2004 Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)