Hostname: page-component-586b7cd67f-dsjbd Total loading time: 0 Render date: 2024-11-28T08:41:19.462Z Has data issue: false hasContentIssue false
  • English
  • Français

Progress with the IBM Very High Resolution STEM

Published online by Cambridge University Press:  02 July 2020

RE. Batson ,
H.W. Mook ,
P. Kruit ,
O.L. Krivanek  and
N. Dellby
RE. Batson
Affiliation:
IBM, T.J. Watson Research Center, Yorktown Heights, New York, 10598
H.W. Mook*
Affiliation:
tDelft University of Technology, Delft, The Netherlands
P. Kruit
Affiliation:
tDelft University of Technology, Delft, The Netherlands
O.L. Krivanek
Affiliation:
>Nion, Inc., Kirkland, Washington
N. Dellby
Affiliation:
>Nion, Inc., Kirkland, Washington
*
§Present address: FEI Electron Optics, Eindhoven, The Netherlands
Get access

Abstract

The IBM high resolution STEM project has now reached the point where integration of new subsystems into the instrument is the main activity. During the past three years, we have demonstrated a 50meV EELS resolution using a high brightness electron monochromator incorporated into the electron gun [1, 2, 3], and better than 0.14mn spatial resolution using spherical aberration correction at 120KeV. [4] Recent effort has been to identify and remove many sources of instabilities in the original instrument; to rebuild several existing subsidiary pieces of equipment such as the ADF detector, the EELS spectrometer electron optical coupling, and the EELS CCD detection system; and to set up software and hardware control of each system to allow routine operation.

The new STEM column is summarized in Fig. 1. Briefly, the original VG gun flange has been lowered about 4cm, using a spacer, to allow insertion of the Fringe Field monochromator.

Type
Quantitative Stem: Imaging and Eels Analysis Honoring the Contributions of John Silcox (Organized by P. Batson, C. Chen and D. Muller)
Information
Microscopy and Microanalysis , Volume 7 , Issue S2: Proceedings: Microscopy & Microanalysis 2001, Microscopy Society of America 59th Annual Meeting, Microbeam Analysis Society 35th Annual Meeting, Long Beach, California August 5-9, 2001 , August 2001 , pp. 234 - 235
Copyright
Copyright © Microscopy Society of America 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

References:

[1]Mook, H.W., Batson, P.E., and Kruit, P., in Electron Microscopy and Analysis 1999, edited by C.J. Kiely, (Institute of Physics, Bristol, 1999), Vol. 161, pp. 223–226.Google Scholar
[2]Mook, H.W. and Batson, P.E., in Microscopy and Microanalysis, edited by Bailey, G.W., Jerome, W.G., McKernan, S., Mansfield, J.F., and Price, R.L. (Springer-Verlag, New York, 1999), pp. 648–649.Google Scholar
[3]Batson, P.E., Mook, H.W., and Kruit, P., in International Union of Microbeam Analysis 2000, edited by Williams, D.B. and Shimizu, R. (Institute of Physics, Bristol, 2000), Vol. 165, pp. 213–214.Google Scholar
[4]Dellby, N., Krivanek, O.L., Nellist, P.D., Batson, P.E., and Lupini, A.R., J. Electron Microscopy, (2001), in press.Google Scholar
[5]Batson, P.E., Ultramicroscopy, 78 (1999)33.CrossRefGoogle Scholar