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Preparation and Analysis of Atom Probe Tips by Xenon Focused Ion Beam Milling

Published online by Cambridge University Press:  08 April 2016

Robert Estivill ,
Guillaume Audoit ,
Jean-Paul Barnes ,
Adeline Grenier  and
Didier Blavette
Robert Estivill*
Affiliation:
University of Grenoble Alpes, F-38000 Grenoble, France CEA, LETI, MINATEC Campus, F-38054 Grenoble, France STMicroelectronics, 850 rue Jean Monnet, 38926 Crolles, France Groupe de Physique des Matériaux—GPM UMR CNRS 6634, Université de Rouen, France
Guillaume Audoit
Affiliation:
University of Grenoble Alpes, F-38000 Grenoble, France CEA, LETI, MINATEC Campus, F-38054 Grenoble, France
Jean-Paul Barnes
Affiliation:
University of Grenoble Alpes, F-38000 Grenoble, France CEA, LETI, MINATEC Campus, F-38054 Grenoble, France
Adeline Grenier
Affiliation:
University of Grenoble Alpes, F-38000 Grenoble, France CEA, LETI, MINATEC Campus, F-38054 Grenoble, France
Didier Blavette
Affiliation:
Groupe de Physique des Matériaux—GPM UMR CNRS 6634, Université de Rouen, France
*
*Corresponding author. [email protected]
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Abstract

The damage and ion distribution induced in Si by an inductively coupled plasma Xe focused ion beam was investigated by atom probe tomography. By using predefined patterns it was possible to prepare the atom probe tips with a sub 50 nm end radius in the ion beam microscope. The atom probe reconstruction shows good agreement with simulated implantation profiles and interplanar distances extracted from spatial distribution maps. The elemental profiles of O and C indicate co-implantation during the milling process. The presence of small disc-shaped Xe clusters are also found in the three-dimensional reconstruction. These are attributed to the presence of Xe nanocrystals or bubbles that open during the evaporation process. The expected accumulated dose points to a loss of >95% of the Xe during analysis, which escapes undetected.

Keywords

atom probefocused ion beamsample preparationxenonannular milling
Type
Technique and Instrumentation Development
Information
Microscopy and Microanalysis , Volume 22 , Issue 3 , June 2016 , pp. 576 - 582
Copyright
Copyright © Microscopy Society of America 2016

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