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High-Resolution TEM and the Application of Direct and Indirect Aberration Correction

Published online by Cambridge University Press:  03 January 2008

Crispin J.D. Hetherington ,
Lan-Yun Shery Chang ,
Sarah Haigh ,
Peter D. Nellist ,
Lionel Cervera Gontard ,
Rafal E. Dunin-Borkowski  and
Angus I. Kirkland
Crispin J.D. Hetherington
Affiliation:
Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK
Lan-Yun Shery Chang
Affiliation:
Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK
Sarah Haigh
Affiliation:
Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK
Peter D. Nellist
Affiliation:
Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK
Lionel Cervera Gontard
Affiliation:
Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge CB2 3QZ, UK Now at: Centre for Electron Nanoscopy, Technical University of Denmark, DK-2800 Kongens Lyngby, Denmark
Rafal E. Dunin-Borkowski
Affiliation:
Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge CB2 3QZ, UK Now at: Centre for Electron Nanoscopy, Technical University of Denmark, DK-2800 Kongens Lyngby, Denmark
Angus I. Kirkland
Affiliation:
Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK
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Abstract

Aberration correction leads to a substantial improvement in the directly interpretable resolution of transmission electron microscopes. Correction of the aberrations has been achieved electron-optically through a hexapole-based corrector and also indirectly by computational analysis of a focal or tilt series of images. These direct and indirect methods are complementary, and a combination of the two offers further advantages. Materials characterization has benefitted from the reduced delocalization and higher resolution in the corrected images. It is now possible, for example, to locate atomic columns at surfaces to higher accuracy and reliability. This article describes the JEM-2200FS in Oxford, which is equipped with correctors for both the image-forming and probe-forming lenses. Examples of the use of this instrument in the characterization of nanocrystalline catalysts are given together with initial results combining direct and indirect methods. The double corrector configuration enables direct imaging of the corrected probe, and a potential confocal imaging mode is described. Finally, modifications to a second generation instrument are outlined.

Keywords

aberration correctionnanocrystalline catalysisconfocal imagingexit-wavefunction reconstruction
Type
Research Article
Information
Microscopy and Microanalysis , Volume 14 , Issue 1: Special Issue: Materials Research in an Aberration-Free Environment , February 2008 , pp. 60 - 67
Copyright
© 2008 Microscopy Society of America

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