Hostname: page-component-586b7cd67f-t7fkt Total loading time: 0 Render date: 2024-11-28T18:34:40.724Z Has data issue: false hasContentIssue false

The Effect of Charging on Electron Diffusion in Solids

Published online by Cambridge University Press:  02 July 2020

Hendrix Demers
Affiliation:
Département de génie mécanique, Université de Sherbrooke, Sherbrooke, Québec, Canada, J1K 2R1
Raynald Gauvm
Affiliation:
Département de génie mécanique, Université de Sherbrooke, Sherbrooke, Québec, Canada, J1K 2R1
Get access

Abstract

The studies of insulating specimen by using scanning electron microscopy (SEM) or associated microanalytical techniques such as electron probe microanalysis (EPMA), Auger electron spectroscopy (AES), etc., is limited by the charging phenomena. Different techniques have been found to minimize this problem: coating the specimen with a conductor, working at low energy [1], etc. But for a better knowledge of this effect, we have started a study of the mechanisms of charging as well as its effect on the electrons trajectories in the case of an insulating specimen. with the success, in past years, of Monte Carlo (MC) simulation of electron scattering in solid specimens [2], we have been developing a new Monte Carlo program for the simulation of the electron trajectory in insulators.

With this program, we want to understand the effect of the trapping charge on a insulating specimen. The new MC will be constructed by adding a succession of refined model. in each step, the model goes deeper in the mechanisms for the charging phenomena.

Type
Quantitative X-Ray Microanalysis in the Microprobe, in the SEM and in The ESEM:Theory and Practice (Organized by R. Gauvin and E. Lifshin)
Copyright
Copyright © Microscopy Society of America 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1Joy, DC. and Joy, C.S., Low Voltage Scanning Electron Microscopy, MICRON., 27 (3-4), 247263 (1996).CrossRefGoogle Scholar
2Hovington, P. et al.,CASINO: A new Monte Carlo code in C language for the electron beam interactions - Parti: Description of the Program, SCANNING, 19, 114 (1997).Google Scholar
3Odof, S., Microanalyse Xdes isolants: simulation de Monte-Carlo, 2000, Ph.D. Thesis, University of Reims Champagne- Ardenne.Google Scholar
4Jbara, O. et al., Electron Probe Microanalysis of Insulating Oxides: Monte Carlo Simulations, X-RAY SPECTROMETRY, 26, 291302 (1997).3.0.CO;2-X>CrossRefGoogle Scholar