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EBSD in FESEM and LVSEM

Published online by Cambridge University Press:  02 July 2020

Patrick Camus*
Affiliation:
NORAN Instruments Inc., 2551 West Beltline Highway, Middleton, WI53562USA
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Background

Electron backscattered diffraction (EBSD) is a very powerful analysis technique to understand the crystallography of a sample in the SEM. Typically, a high beam current is needed to obtain good results because of inefficient collection of the patterns. In W-filament SEM's, the high beam current necessitates a large spot size and requisite low image resolution. The large beam current can also be a source of problems for insulating samples or sample mounts by causing charging and the resulting image drift.

To reduce the spot size with adequate beam currents for imaging, field-emission (FE) guns are used. For most FESEM's, the beam current is markedly reduced from that produced by W-filament instruments. Even though the image resolution is better, the EBSD performance tends to suffer at low beam currents for standard hardware configurations. To regain the performance of a comparable W-filament system, the EBSD hardware should be changed for the low beam current operation. This paper will address the hardware considerations for low beam current applications.

Type
Advances in the Instrumentation and Application of Electron Backscatter Diffraction in the SEM
Copyright
Copyright © Microscopy Society of America

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