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Characterization of Phase Transformation by Fe-SEM and Fe-TEM Analysis

Published online by Cambridge University Press:  02 July 2020

Paula Horny ,
Dominique Drouin ,
Raynald Gauvin  and
Gianluigi A. Botton
Paula Horny
Affiliation:
Université de Sherbrooke, Département de génie mécanique, Sherbrooke, Québec, J1K 2R1, Canada
Dominique Drouin
Affiliation:
Universitée de Sherbrooke, Département de génie électnque, Quantiscript, Sherbrooke, Québec, J1K 2R1, Canada
Raynald Gauvin
Affiliation:
Université de Sherbrooke, Département de génie mécanique, Sherbrooke, Québec, J1K 2R1, Canada
Gianluigi A. Botton
Affiliation:
Laboratoire de la Technologie des Matériaux, Ressources Naturelles Canada, Ottawa, Ontario, K1A 0G1 , Canada
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Abstract

The formation of a silicon alloy has been achieved by electron beam irradiation of a nickel-silicon bilayer. This process, called SiDWEL1 , has been developed by Quantiscript. The nickel-silicon bilayer is very thin and the electron beam operates at low energy and current. Silicide formation occurred around the interaction volume of the electrons within the material. This paper describes the nature of the structures produced and the origin of the difficulties encountered with the characterization. The necessity of further analysis with TEM based techniques is highlighted.

Figure 1 presents a cross-section of a typical sample. The growth of silicide grains is induced by the e-beam irradiation of the stack for few microseconds. Nucieation is initiated by the diffusion of silicon atoms in nickel grains, induced by the heating arising from the electron beam interaction with the solid. A new phase is revealed by FE-SEM observation, after wet etching of the nickel film, as shown in figures 2 and 3.

Type
Microscopy in the Real World: Semiconductors and Materials
Information
Microscopy and Microanalysis , Volume 7 , Issue S2: Proceedings: Microscopy & Microanalysis 2001, Microscopy Society of America 59th Annual Meeting, Microbeam Analysis Society 35th Annual Meeting, Long Beach, California August 5-9, 2001 , August 2001 , pp. 490 - 491
Copyright
Copyright © Microscopy Society of America 2001

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References

1. Lavallee, E., Beauvais, J. et Drouin, D., J. Vac. Sci. Technol. A, 18, 681–684, (2000)CrossRefGoogle Scholar

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