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Authors' Response

Published online by Cambridge University Press:  01 August 2004

A.C. Diebold ,
B. Foran ,
C. Kisielowski ,
D.A. Muller ,
S.J. Pennycook ,
E. Principe  and
S. Stemmer
A.C. Diebold
Affiliation:
International SEMATECH
B. Foran
Affiliation:
International SEMATECH
C. Kisielowski
Affiliation:
National Center for Electron Microscopy
D.A. Muller
Affiliation:
Bell Laboratories Lucent Technologies
S.J. Pennycook
Affiliation:
Oak Ridge National Laboratories
E. Principe
Affiliation:
Applied Materials
S. Stemmer
Affiliation:
University of California-Santa Barbara
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Extract

The main purpose of the article by A.C. Diebold and coworkers (2003) is to propose a robust method for determination of gate oxide thickness. O'Keefe objects to a statement in this paper that “Lattice images do NOT depict the projected atom columns; instead, they are interference patterns of the directly transmitted beam with diffracted beams.”

Type
Letter to the Editor
Information
Microscopy and Microanalysis , Volume 10 , Issue 4 , August 2004 , pp. 399 - 400
Copyright
© 2004 Microscopy Society of America

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References

REFERENCES

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Kisielowski, C., Nelson, E.C., Song, C., Kilaas, R., & Thust, A. (2000). Aberration corrected lattice imaging with sub-Angstrom resolution. Microsc Microanal 6(Suppl. 2), 16–17.Google Scholar
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