Article contents
Applications of Ion Microscopy and In Situ Electron Microscopy to the Study of Electronic Materials and Devices
Published online by Cambridge University Press: 28 July 2005
Abstract
We discuss the application of ion microscopy and in situ electron microscopy to the study of electronic and optical materials and devices. We demonstrate how the combination of in situ transmission electron microscopy and focused ion beam microscopy provides new avenues for the study for such structures, enabling extension of these techniques to the study of dopant distributions, nanoscale stresses, three-dimensional structural and chemical reconstruction, and real-time evolution of defect microstructure. We also discuss in situ applications of thermal, mechanical, electrical, and optical stresses during transmission electron microscopy imaging.
- Type
- 1998 ASU ELECTRON MICROSCOPY WORKSHOP
- Information
- Copyright
- © 2005 Microscopy Society of America
- 2
- Cited by