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Application of the CrossBeam Technology to TEM Sample Preparation and Nanolithography

Published online by Cambridge University Press:  01 August 2004

Peter Gnauck
Affiliation:
LEO Electron Microscopy, Oberkochen, Germany
Ulrike Zeile
Affiliation:
LEO Electron Microscopy, Oberkochen, Germany
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Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Type
Research Article
Copyright
© 2004 Microscopy Society of America

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