Hostname: page-component-586b7cd67f-t7czq Total loading time: 0 Render date: 2024-11-30T23:41:16.939Z Has data issue: false hasContentIssue false
  • English
  • Français

AES Investigation of Inhomogenous Metal-Insulator Samples

Published online by Cambridge University Press:  15 November 2005

Gábor Dobos ,
György Vida ,
Zoltán Tóth  and
Katalin Josepovits
Gábor Dobos
Affiliation:
Budapest University of Technology and Economics, Department of Atomic Physics, Surface Physics Laboratory, Budafoki Street 8, Budapest, H-1111, Hungary
György Vida
Affiliation:
General Electric Consumer & Industrial, Váci Street 77, Budapest, H-1340, Hungary
Zoltán Tóth
Affiliation:
General Electric Consumer & Industrial, Váci Street 77, Budapest, H-1340, Hungary
Katalin Josepovits
Affiliation:
Budapest University of Technology and Economics, Department of Atomic Physics, Surface Physics Laboratory, Budafoki Street 8, Budapest, H-1111, Hungary
Get access

Abstract

In this article, the secondary electron-emission properties of both vertically and laterally inhomogeneous samples are discussed. To study the effect of surface coverage, the total electron-emission yield of tungsten and niobium samples was measured as a function of primary electron energy and oxide thickness. A method is suggested to avoid charging difficulties during AES measurements of samples that consist of both metal and various insulator parts.

Keywords

AEScharginginhomogeneityniobiumsecondary electron emissiontungsten
Type
Papers from the European Microbeam Analysis Society Regional Workshop in Bled, Slovenia
Information
Microscopy and Microanalysis , Volume 11 , Issue 6 , December 2005 , pp. 567 - 571
Copyright
© 2005 Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Benka, O. & Steinbatz, M. (2003). Oxidation of aluminium studied by secondary electron emission. Surf Sci 525, 207–214.Google Scholar
Grunder, M. & Halbritter, J. (1980). XPS and AES studies on oxide growth and oxide coatings on niobium. J Appl Phys 51, 397–405.Google Scholar
Karulkar, P.C. (1981). Effects of sputtering on the surface composition of niobium oxides. J Vac Sci Technol 18, 169–174.Google Scholar
Le Gressus, C., Okuzumi, H., & Massignon, D. (1981). Changes of secondary-electron image brightness under electron-irradiation as studied by electron spectroscopy. Scan Electron Microsc 1, 251–261.Google Scholar
Seah, M.P. & Spencer, J.J. (2000). AES of bulk insulators—Control and characterisation of the surface charge. J Electron Spectrosc 109, 291–308.Google Scholar
Seiler, H. (1983). Secondary electron emission in the scanning electron microscope. J Appl Phys 54, R1–R18.Google Scholar
Wannaparhun, S., Seal, S., Scammon, K., Desai, V., & Rahman, Z. (2001). Physics of insulating specimen preparation for non-charging Auger electron spectroscopy. J Phys D: Appl Phys 34, 3319–3326.Google Scholar