Hostname: page-component-586b7cd67f-t7fkt Total loading time: 0 Render date: 2024-11-27T19:14:41.819Z Has data issue: false hasContentIssue false
  • English
  • Français

A 2-2-2 200kv Field Emission STEM/TEM System

Published online by Cambridge University Press:  02 July 2020

E D Boyes ,
J Ringnalda ,
M A J van der Stam ,
T F Fliervoet  and
E Van Cappellen
E D Boyes
Affiliation:
DuPont Company, CR&D, Experimental Station, Wilmington, DE, 19880-0356, USA
J Ringnalda
Affiliation:
FEI Company, , Hillsboro, OR, 97125-5830, USA
M A J van der Stam
Affiliation:
FEI Electron Optics, 5651, GG, Eindhoven, The Netherlands
T F Fliervoet
Affiliation:
FEI Electron Optics, 5651, GG, Eindhoven, The Netherlands
E Van Cappellen
Affiliation:
FEI Company, , Hillsboro, OR, 97125-5830, USA
Get access

Abstract

In many new application areas it is necessary to combine atomic resolution imaging with atomic level chemical and crystallographic analysis. The new applications include microbiology, nanotubes, smart materials and sensor initiatives, and the myriad semiconductor fields. Along with these there are many other valuable applications in older and more established technologies such as chemicals, catalysis, pigments and construction materials for chemical plants, airplanes, pipelines, power generation, and other aspects of societal infrastructure. Analysis down to the atomic level will help to solve recalcitrant problems and open up some reluctant opportunities in these fields. They can be very effective in resolving important and long standing issues with huge potential monetary and societal costs and benefits. Key aspects of environmentally sensitive corrosion and pollution control may also require the support of similarly sophisticated imaging and microanalysis.

We think the capabilities of a new generation high performance instrument should include atomic resolution coherent TEM imaging and also incoherent atomic number (Z) contrast high angle annular dark field (HAADF) STEM imaging.

Type
Quantitative Stem: Imaging and Eels Analysis Honoring the Contributions of John Silcox (Organized by P. Batson, C. Chen and D. Muller)
Information
Microscopy and Microanalysis , Volume 7 , Issue S2: Proceedings: Microscopy & Microanalysis 2001, Microscopy Society of America 59th Annual Meeting, Microbeam Analysis Society 35th Annual Meeting, Long Beach, California August 5-9, 2001 , August 2001 , pp. 232 - 233
Copyright
Copyright © Microscopy Society of America 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)